Finnish company, Picosun Oy along with Professor Sean Barry and Jason Coyle at Carleton University (Ottawa, Canada) have developed a new process for atomic layer deposition (from the July 11, 2011 news item on Nanowerk),
Picosun Oy, Finland-based global manufacturer of state-of-the-art Atomic Layer Deposition (ALD) equipment, reports successful process for preparation of gold thin films with plasma-enhanced ALD (PEALD) method first time in the world. Gold films were grown in Picosun’s SUNALE™ ALD reactor equipped with the same company’s Picoplasma™ plasma source system on top of ruthenium underlayers, from precursor chemicals developed and synthesized by Prof. Sean Barry and Ph.D. student Jason Coyle from Carleton University, Ottawa, Canada.
“Coinage metals (Cu, Ag, Au) are poised to play a significant role also in sensing technologies, where they will be crucial in signal enhancement and as anchor surfaces for organic sensing elements. Using plasma to deposit these metals as an ALD process widens drastically the deposition temperature window, permitting the employment of such sensitive substrates as modified fiber optic filaments and plastics. The design of the Picoplasma™ tool allows for excellent uniformity over a wide deposition area, while minimizing substrate damage from the plasma source”, states Prof. Barry from Carleton University.