Tag Archives: 7nm (nanometer) computer chips

7nm (nanometre) chip shakeup

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From time to time I check out the latest on attempts to shrink computer chips. In my July 11, 2014 posting I noted IBM’s announcement about developing a 7nm computer chip and later in my July 15, 2015 posting I noted IBM’s announcement of a working 7nm chip (from a July 9, 2015 IBM news release , “The breakthrough, accomplished in partnership with GLOBALFOUNDRIES and Samsung at SUNY Polytechnic Institute’s Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE), could result in the ability to place more than 20 billion tiny switches — transistors — on the fingernail-sized chips that power everything from smartphones to spacecraft.”

I’m not sure what happened to the IBM/Global Foundries/Samsung partnership but Global Foundries recently announced that it will no longer be working on 7nm chips. From an August 27, 2018 Global Foundries news release,

GLOBALFOUNDRIES [GF] today announced an important step in its transformation, continuing the trajectory launched with the appointment of Tom Caulfield as CEO earlier this year. In line with the strategic direction Caulfield has articulated, GF is reshaping its technology portfolio to intensify its focus on delivering truly differentiated offerings for clients in high-growth markets.

GF is realigning its leading-edge FinFET roadmap to serve the next wave of clients that will adopt the technology in the coming years. The company will shift development resources to make its 14/12nm FinFET platform more relevant to these clients, delivering a range of innovative IP and features including RF, embedded memory, low power and more. To support this transition, GF is putting its 7nm FinFET program on hold indefinitely [emphasis mine] and restructuring its research and development teams to support its enhanced portfolio initiatives. This will require a workforce reduction, however a significant number of top technologists will be redeployed on 14/12nm FinFET derivatives and other differentiated offerings.

I tried to find a definition for FinFet but the reference to a MOSFET and in-gate transistors was too much incomprehensible information packed into a tight space, see the FinFET Wikipedia entry for more, if you dare.

Getting back to the 7nm chip issue, Samuel K. Moore (I don’t think he’s related to the Moore of Moore’s law) wrote an Aug. 28, 2018 posting on the Nanoclast blog (on the IEEE [Institute of Electronics and Electrical Engineers] website) which provides some insight (Note: Links have been removed),

In a major shift in strategy, GlobalFoundries is halting its development of next-generation chipmaking processes. It had planned to move to the so-called 7-nm node, then begin to use extreme-ultraviolet lithography (EUV) to make that process cheaper. From there, it planned to develop even more advanced lithography that would allow for 5- and 3-nanometer nodes. Despite having installed at least one EUV machine at its Fab 8 facility in Malta, N.Y., all those plans are now on indefinite hold, the company announced Monday.

The move leaves only three companies reaching for the highest rungs of the Moore’s Law ladder: Intel, Samsung, and TSMC.

It’s a huge turnabout for GlobalFoundries. …

GlobalFoundries rationale for the move is that there are not enough customers that need bleeding-edge 7-nm processes to make it profitable. “While the leading edge gets most of the headlines, fewer customers can afford the transition to 7 nm and finer geometries,” said Samuel Wang, research vice president at Gartner, in a GlobalFoundries press release.

“The vast majority of today’s fabless [emphasis mine] customers are looking to get more value out of each technology generation to leverage the substantial investments required to design into each technology node,” explained GlobalFoundries CEO Tom Caulfield in a press release. “Essentially, these nodes are transitioning to design platforms serving multiple waves of applications, giving each node greater longevity. This industry dynamic has resulted in fewer fabless clients designing into the outer limits of Moore’s Law. We are shifting our resources and focus by doubling down on our investments in differentiated technologies across our entire portfolio that are most relevant to our clients in growing market segments.”

(The dynamic Caulfield describes is something the U.S. Defense Advanced Research Agency is working to disrupt with its $1.5-billion Electronics Resurgence Initiative. Darpa’s [DARPA] partners are trying to collapse the cost of design and allow older process nodes to keep improving by using 3D technology.)

…

Fabless manufacturing is where the fabrication is outsourced and the manufacturing company of record is focused on other matters according to the Fabless manufacturing Wikipedia entry.

Roland Moore-Colyer (I don’t think he’s related to Moore of Moore’s law either) has written August 28, 2018 article for theinquirer.net which also explores this latest news from Global Foundries (Note: Links have been removed),

EVER PREPPED A SPREAD for a party to then have less than half the people you were expecting show up? That’s probably how GlobalFoundries [sic] feels at the moment.

The chip manufacturer, which was once part of AMD, had a fabrication process geared up for 7-nanometre chips which its customers – including AMD and Qualcomm – were expected to adopt.

But AMD has confirmed that it’s decided to move its 7nm GPU production to TSMC, and Intel is still stuck trying to make chips based on 10nm fabrication.

…

Arguably, this could mark a stymieing of innovation and cutting-edge designs for chips in the near future. But with processors like AMD’s Threadripper 2990WX overclocked to run at 6GHz across all its 32 cores, in the real-world PC fans have no need to worry about consumer chips running out of puff anytime soon. µ

That’s all folks.

Maybe that’s not all

Steve Blank in a Sept. 10, 2018 posting on the Nanoclast blog (on the IEEE [Institute of Electrical and Electronics Engineers] website) provides some provocative commentary on the Global Foundries announcement (Note: A link has been removed),

For most of our lives, the idea that computers and technology would get better, faster, and cheaper every year was as assured as the sun rising every morning. The story “GlobalFoundries Halts 7-nm Chip Development”  doesn’t sound like the end of that era, but for you and anyone who uses an electronic device, it most certainly is.

Technology innovation is going to take a different direction.

…

This story just goes on and on

There was a new development according to a Sept. 12, 2018 posting on the Nanoclast blog by, again, Samuel K. Moore (Note Links have been removed),

At an event today [sept. 12, 2018], Apple executives said that the new iPhone Xs and Xs Max will contain the first smartphone processor to be made using 7 nm manufacturing technology, the most advanced process node. Huawei made the same claim, to less fanfare, late last month and it’s unclear who really deserves the accolades. If anybody does, it’s TSMC, which manufactures both chips.

TSMC went into volume production with 7-nm tech in April, and rival Samsung is moving toward commercial 7-nm production later this year or in early 2019. GlobalFoundries recently abandoned its attempts to develop a 7 nm process, reasoning that the multibillion-dollar investment would never pay for itself. And Intel announced delays in its move to its next manufacturing technology, which it calls a 10-nm node but which may be equivalent to others’ 7-nm technology.

…

There’s a certain ‘soap opera’ quality to this with all the twists and turns.

IBM and its working 7nm test chip

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I wrote abut IBM and its plans for a 7nm computer chip last year in a July 11, 2014 posting, which featured IBM and mention of HP Labs and other company’s plans for shrinking their computer chips. Almost one year later, IBM has announced, in a July 9, 2015 IBM news release on PRnewswire.com the accomplishment of a working 7nm test chip,

An alliance led by IBM Research (NYSE: IBM) today announced that it has produced the semiconductor industry’s first 7nm (nanometer) node test chips with functioning transistors.  The breakthrough, accomplished in partnership with GLOBALFOUNDRIES and Samsung at SUNY Polytechnic Institute’s Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE), could result in the ability to place more than 20 billion tiny switches — transistors — on the fingernail-sized chips that power everything from smartphones to spacecraft.

To achieve the higher performance, lower power and scaling benefits promised by 7nm technology, researchers had to bypass conventional semiconductor manufacturing approaches. Among the novel processes and techniques pioneered by the IBM Research alliance were a number of industry-first innovations, most notably Silicon Germanium (SiGe) channel transistors and Extreme Ultraviolet (EUV) lithography integration at multiple levels.

Industry experts consider 7nm technology crucial to meeting the anticipated demands of future cloud computing and Big Data systems, cognitive computing, mobile products and other emerging technologies. Part of IBM’s $3 billion, five-year investment in chip R&D (announced in 2014), this accomplishment was made possible through a unique public-private partnership with New York State and joint development alliance with GLOBALFOUNDRIES, Samsung and equipment suppliers. The team is based at SUNY Poly’s NanoTech Complex in Albany [New York state].

“For business and society to get the most out of tomorrow’s computers and devices, scaling to 7nm and beyond is essential,” said Arvind Krishna, senior vice president and director of IBM Research. “That’s why IBM has remained committed to an aggressive basic research agenda that continually pushes the limits of semiconductor technology. Working with our partners, this milestone builds on decades of research that has set the pace for the microelectronics industry, and positions us to advance our leadership for years to come.”

Microprocessors utilizing 22nm and 14nm technology power today’s servers, cloud data centers and mobile devices, and 10nm technology is well on the way to becoming a mature technology. The IBM Research-led alliance achieved close to 50 percent area scaling improvements over today’s most advanced technology, introduced SiGe channel material for transistor performance enhancement at 7nm node geometries, process innovations to stack them below 30nm pitch and full integration of EUV lithography at multiple levels. These techniques and scaling could result in at least a 50 percent power/performance improvement for next generation mainframe and POWER systems that will power the Big Data, cloud and mobile era.

“Governor Andrew Cuomo’s trailblazing public-private partnership model is catalyzing historic innovation and advancement. Today’s [July 8, 2015] announcement is just one example of our collaboration with IBM, which furthers New York State’s global leadership in developing next generation technologies,” said Dr. Michael Liehr, SUNY Poly Executive Vice President of Innovation and Technology and Vice President of Research.  “Enabling the first 7nm node transistors is a significant milestone for the entire semiconductor industry as we continue to push beyond the limitations of our current capabilities.”

“Today’s announcement marks the latest achievement in our long history of collaboration to accelerate development of next-generation technology,” said Gary Patton, CTO and Head of Worldwide R&D at GLOBALFOUNDRIES. “Through this joint collaborative program based at the Albany NanoTech Complex, we are able to maintain our focus on technology leadership for our clients and partners by helping to address the development challenges central to producing a smaller, faster, more cost efficient generation of semiconductors.”

The 7nm node milestone continues IBM’s legacy of historic contributions to silicon and semiconductor innovation. They include the invention or first implementation of the single cell DRAM, the Dennard Scaling Laws, chemically amplified photoresists, copper interconnect wiring, Silicon on Insulator, strained engineering, multi core microprocessors, immersion lithography, high speed SiGe, High-k gate dielectrics, embedded DRAM, 3D chip stacking and Air gap insulators.

In 2014, they were talking about carbon nanotubes with regard to the 7nm chip, this shift to silicon germanium is interesting.

Sebastian Anthony in a July 9, 2015 article for Ars Technica offers some intriguing insight into the accomplishment and the technology (Note: A link has been removed),

… While it should be stressed that commercial 7nm chips remain at least two years away, this test chip from IBM and its partners is extremely significant for three reasons: it’s a working sub-10nm chip (this is pretty significant in itself); it’s the first commercially viable sub-10nm FinFET logic chip that uses silicon-germanium as the channel material; and it appears to be the first commercially viable design produced with extreme ultraviolet (EUV) lithography.

…

Technologically, SiGe and EUV are both very significant. SiGe has higher electron mobility than pure silicon, which makes it better suited for smaller transistors. The gap between two silicon nuclei is about 0.5nm; as the gate width gets ever smaller (about 7nm in this case), the channel becomes so small that the handful of silicon atoms can’t carry enough current. By mixing some germanium into the channel, electron mobility increases, and adequate current can flow. Silicon generally runs into problems at sub-10nm nodes, and we can expect Intel and TSMC to follow a similar path to IBM, GlobalFoundries, and Samsung (aka the Common Platform alliance).

EUV lithography is an more interesting innovation. Basically, as chip features get smaller, you need a narrower beam of light to etch those features accurately, or you need to use multiple patterning (which we won’t go into here). The current state of the art for lithography is a 193nm ArF (argon fluoride) laser; that is, the wavelength is 193nm wide. Complex optics and multiple painstaking steps are required to etch 14nm features using a 193nm light source. EUV has a wavelength of just 13.5nm, which will handily take us down into the sub-10nm realm, but so far it has proven very difficult and expensive to deploy commercially (it has been just around the corner for quite a few years now).

If you’re interested in the nuances, I recommend reading Anthony’s article in its entirety.

One final comment, there was no discussion of electrodes or other metallic components associated with computer chips. The metallic components are a topic of some interest to me (anyway), given some research published by scientists at the Massachusetts Institute of Technology (MIT) last year. From my Oct. 14, 2014 posting,

Research from the Massachusetts Institute of Technology (MIT) has revealed a new property of metal nanoparticles, in this case, silver. From an Oct. 12, 2014 news item on ScienceDaily,

A surprising phenomenon has been found in metal nanoparticles: They appear, from the outside, to be liquid droplets, wobbling and readily changing shape, while their interiors retain a perfectly stable crystal configuration.

The research team behind the finding, led by MIT professor Ju Li, says the work could have important implications for the design of components in nanotechnology, such as metal contacts for molecular electronic circuits. [my emphasis added]

This discovery and others regarding materials and phase changes at ever diminishing sizes hint that a computer with a functioning 7nm chip might be a bit further off than IBM is suggesting.