The Sabanci University’s (Istanbul, Turkey) new Nanotechnology and Application Center (SUNAC) has placed an order for an electron-beam lithography system. From the Jan. 26 2011 news item on Nanowerk,

“The EBPG5000plusES is a 100kV high performance system, which is state of the art. It will enable us to address the nanotechnology development needs of natural sciences, applied sciences and engineering programs”, says Dr. Volkan Özgüz, Director of the Nanotechnology and Application Center. “Due to its flexibility and advantages, the EBPG5000plusES is a perfect investment for the future and will help to establish SUNAC as one of Turkeys leading nanotechnology institution.”

Vistec’s EBPG5000plusES are dedicated electron-beam lithography systems, which have been developed to meet the diverse requirements for advanced nano-lithography applications in direct write for both R&D and production of GaAs devices. It enables a rapid exposure with a 25MHz rate and a minimum feature size of less than 8nm. The EBPG5000plusES system is capable to expose various substrate types including masks and dimensions up to 150mm size.

This is the first “nanotechnology in Turkey” item I’ve come across. It caught my eye since Sabanci University will be hosting the 2011 International Symposium on Electronic Arts (ISEA), Sept. 14 – 21 2011. (I posted about my experiences at ISEA 2009 in Belfast in my Sept. 30, 2009 and Oct. 1, 2009 postings.) I didn’t get to the 2010 ISEA but have submitted an abstract of paper for 2011 in Istanbul.